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用H2O2-H2SO4合成低硫GIC的研究
INVESTIGATION ON SYNTHESIS OF LOW-SULFUR GIC IN H2O2-H2SO4 SOLUTION
【摘要】 采用化学氧化法在浓硫酸与双氧水混合液中合成了H2SO4-GIC ,研究了插层工艺参数如双氧水浓度、双氧水与浓硫酸的配比以及水洗液的pH值、烘干温度、膨化温度等对膨胀容积和残余硫含量的影响 ,同时也对整个插层机理进行了探讨 ,得到了制造低硫膨胀石墨的合理工艺参数。
【Abstract】 H2SO4-GIC was chemically synthesized in the concentrated sulfuric acid, in which hydrogen peroxide acted as oxidant. The present work studies the factors that influence the residual sulfur content and exfoliated volume, such as hydrogen peroxide concentration, the ratio of hydrogen peroxide and concentrated sulfuric acid, the pH value of the rinsing liquid, drying temperature and exfoliated temperature. The rational parameters for synthesizing low-sulfur GIC are obtained, and the intercalation mechanism is also discussed.
【关键词】 石墨层间化合物;
膨胀石墨;
硫含量;
膨胀容积;
【Key words】 Graphite intercalation compounds (GIC); exfoliated graphite; sulfur content, exfoliated volume;
【Key words】 Graphite intercalation compounds (GIC); exfoliated graphite; sulfur content, exfoliated volume;
【基金】 国学自然科学基金!项目(59872017)
- 【文献出处】 炭素技术 ,CARBON TECHNIQUES , 编辑部邮箱 ,2000年02期
- 【分类号】TQ175
- 【被引频次】33
- 【下载频次】321