节点文献
沉积电压对辅助加热PCVD-TiN涂层的影响
The Effect of Deposition Voltage on Auxiliary Heat PCVD-TiN Coatings
【摘要】 研究了不同的沉积电压对辅助加热式PCVD -TiN涂层的影响。实验证明 ,提高沉积电压可以细化TiN涂层的柱状晶结构 ,增加TiN涂层的显微硬度和沉积速率。在试验范围内 ,涂层内残存的氯含量基本不受沉积电压的影响
【Abstract】 The effect of deposition voltage on auxiliary heat PCVD-TiN coatings has been studied. The experiments indicated that the deposition rate and the hardness of the TiN coatings are direct proportion to the deposition voltage. The fracture of the TiN coatings is columnar structure and close in texture with the rise of the deposition voltage. There is no relationship between the deposition voltage and the chlorine content.
【基金】 山东省自然科学基金项目 !(F110 93)
- 【文献出处】 青岛化工学院学报(自然科学版) ,JOURNAL OF QINGDAO INSTITUTE OF CHEMICAL TECHNOLOGY , 编辑部邮箱 ,2000年02期
- 【分类号】O646
- 【被引频次】1
- 【下载频次】27