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等离子体浸没N+注入豌豆种子的生长发育效应初报
THE CROWTH EFFECT BY N~+ USING A PLASMA IMERSION ION IMPLANTER OF PEA SEED IMPLANTED
【摘要】 就等离子体浸没离子注入豌豆休眠种子后 ,对其生长发育的遗传学效应进行了研究。结果表明 ,经处理后的种子的萌发率明显下降 ,出苗、生长发育均呈滞后现象 ,且降低了株高。 2 0min为半致死剂量。提出等离子体浸设离子注入可以作为诱变育种的一种经济、有效的诱变方法。
【Abstract】 The genetic effect on plant growth by plasma immersion ion implanter after implantation on pea seed was studied. The results showed the seed treated was not only the germination percentage decline but also the plant growth retardation,and the stem of a plant was low. The semilethal dosage was 20 minutes. Being an economical and available method plasma immersion ion implantation in mutagenic breeding was proposed.
【基金】 中国科学院冶金所离子束开放研究实验室资助课题!( 2 310 )
- 【文献出处】 植物研究 , 编辑部邮箱 ,2000年04期
- 【分类号】S643
- 【被引频次】2
- 【下载频次】56