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铜基上锑的电结晶机理研究

Study of Electrocrystallization Mechanism of Sb on Cu Electrode

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【作者】 项生昌朱则善赵崇涛

【Author】 XIANG Sheng chang,ZHU Ze shan,ZHAO Chong tao (Department of Chemistry,Fujian Normal University,Fuzhou 350007,China)

【机构】 福建师范大学化学系!福建福州350007

【摘要】 采用电位阶跃法研究了铜基体上柠檬酸及其钾盐的缓冲溶液中锑的电结晶过程。其电流与时间关系图中出现两个电流峰 ,锑在Cu基上先形成一个单层 ,而后再在Sb单层上沉积。根据Scharifker方程将实验数据进行拟合 ,结果表明 :在低过电位下 ,属于连续成核机理 ;高过电位下 ,则表现为瞬间成核机理。

【Abstract】 The single potential method was adopted to study the electrocrystallization of Sb on the copper cathode from aqueous citric acid and potassium citrate bath. According to the theoretical equations given by Scharifker, the experimental data were fitted into curves.The results show that there are two current peaks in the eletrocrystallization process of Sb.At low overpotential the electrodeposition of Sb involves three-dimensional progressive nucleation and growth, while at high overpotential it involves three-dimensional instantaneous nucleation and growth.

【基金】 厦门大学固体表面物理化学国家重点实验室资助项目
  • 【被引频次】3
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