【摘要】 根据流体力学理论 ,对脉冲激光沉积KTN薄膜的动力学过程进行了模拟 ,讨论了激光沉积的KTN薄膜厚度分布随基片位置的变化规律 .结果表明 ,等离子体在膨胀过程中会形成垂直靶表面的等离子体羽辉 ,当激光束的位置和方向不变时 ,KTN薄膜的厚度分布不均匀 ,呈现类高斯分布形状 ,薄膜的最大厚度与基片和靶材的距离成负二次方关系更多还原

【Abstract】 The dynamics process of pulsed laser deposition of KTN thin film has been simulated by using the fluid dynamics theory. The expansion process of plasma, the spatial thickness distribution of KTN thin film deposited by pulsed laser, and the dependence of the thickness on the substrate target distance are studied and discussed. The results show that the plasma is argued with pressure gradients in the direction perpendicular to the target surface and the thickness distribution of KTN thin film is not uniform, showing a similar Gaussian profile. The variation in the maximum thickness of the deposit with substrate target distance L can be expressed in the form of d max ∝ L -2 . The calculated results are in good agreement with the experiments .更多还原