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半导体气固相光催化氧化反应介绍

REVIEW OF SEMICONDUCTOR GAS-SOLID PHOTOCATALYTIC OXIDATION

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【作者】 戴智铭朱中南古宏晨

【Author】 DAI Zhi-ming1, ZHU Zhong-nan1, GU Hong-chen2 (1. The United Research Center of Chemical Engineering, ECUST Shanghai 200237, China; 2. Institute of Technical Chemistry and Physics,ECUST Shanghai 200237, China)

【机构】 华东理工大学联合化学反应工程研究所!上海200237华东理工大学技术化学物理研究所!上海200237

【摘要】 介绍了气固相光催化氧化过程的基本原理、反应动力学 ,探讨了反应器模拟和设计计算以及反应器的型式 ,综述了多相光催化反应半导体光催化剂的制备、使用和失活 ,以及大量的光催化制品。

【Abstract】 In this paper, recent research results on mechanism, kinetics were summarized. Reactors used in the onidation processes for the semiconductor were mainly introduced. The photoreactor mathematical models and design were also simplely discussed. Preparation of catalysts and the circumstance of the catalyst deactivation in gas-solid photocatalysis were expounded as well.

  • 【文献出处】 化学反应工程与工艺 ,CHEMICAL REACTION ENGINEERING AND TECHNOLOGY , 编辑部邮箱 ,2000年02期
  • 【分类号】O643
  • 【被引频次】85
  • 【下载频次】414
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