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TiNi形状记忆合金薄膜的表面形貌及影响

The Morphology of TiNi SMA Thin Film and its Influencing Factors

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【作者】 邱平善李丹郭立伟黄渭馨王桂松于卫东

【Author】 QIU Ping-shan;LI Dan;GUO Li-wei;HUANG Wei-xin; WANG Gui-song;YU Wei-dong (Mechanical & Power Engineering College, Harbin Univ. Sci. Tech., Harbin 150080 China)

【机构】 哈尔滨理工大学机械动力工程学院!黑龙江哈尔滨150080哈尔?

【摘要】 研究了TiNi形状记忆合金薄膜的表面形貌及其影响因素.试验结果证明:该薄膜的 形成过程遵循形核、长大、迷津结构和连续膜4个阶段.镀膜时氩分压、基板温度、基板类型、基 板的表面粗糙度以及膜的成分、镀后热处理等都对薄膜的形貌有重大的影响.

【Abstract】 The morphology of TiNi SMA thin film and its influencing factors are researched. It shows that the form of TiNi SMA thin film follows four-period process:forming nucleus, growing up, forming astray-structure and continuous film. There are many factors influencing the morphology of TiNi SMA thin film, which are Argon pressure, substrate temperature, substrate type and roughness of its surface under the regular arc discharge, and composition of the film as well as heat treatment after deposit of the film.

【基金】 国家自然科学基金!59571018
  • 【文献出处】 哈尔滨理工大学学报 ,JOURNAL OF HARBIN UNIVERSITY OF SCIENCE AND TECHNOLOGY , 编辑部邮箱 ,2000年01期
  • 【分类号】TG139.6
  • 【被引频次】10
  • 【下载频次】115
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