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SP~2键含量对非晶金刚石膜电子场发射性能的影响
The Effect of SP~2 Content on Field Emission Character of Amorphous Diamond Film
【摘要】 该文研究了真空磁过滤弧沉积方法制备的非晶金石薄膜 (a-DF)的电子场发射性能 ,SP2 键含量不同的薄膜的场发射性能有很大的差异 ,SP2 键含量越高 ,阈值电场越小 ,发射电流越大 ,同时失效率也较高。SP2 键含量为 6 .5% ,2 0 % ,40 %的薄膜 ,其阈值电场分别为2 .7V/ μm,1 .5V/ μm ,0 .7V/ μm ,远小于金属和硅尖锥的阈值电场。所有样品的发射点均为随机的点状分布。
【Abstract】 Electron field emission character of amorphous diamond film (a-DF) deposited by FAD (Filtered arc deposition) technique with variant SP-2 content have been investigated. The experimental results show tha t with the increasing SP-2 content the turn-on field is decreased, but the fa ilure rate is increased too. The turn-on fields were 2.7V/μm, 1.5V/μm, and 0 .7V/μm for the samples with sp-2 content 6.5%, 20%, 40% respecively. Hypothes is has been proposed to interpret the effect of SP-2 content on field emission character of a-DF.
【Key words】 amorphous diamond film (a-DF)； filtered are deposition (FAD)； SP-2 bond； field emission；
- 【文献出处】 华东师范大学学报(自然科学版) ,JOURNAL OF EASTCHINA NORMAL UNIVERSITY(NATURAL SCIENCE) , 编辑部邮箱 ,2000年02期
- 【分类号】O462.4
- 【被引频次】1
- 【下载频次】44