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直流电弧等离子喷射法沉积大面积金刚石厚膜的研究
Study on deposition of large area diamond wafers by DC arc plasma jet
【摘要】 在自行研制的直流电弧等离子喷射化学气相金刚石膜设备上,初步研究了衬底温度、甲烷浓度、输入功率和循环气量等工艺参数对沉积金刚石膜的影响。总结出了制备各种级别金刚石膜的一般规律。并以11μm/h的沉积速率制备了直径60mm、厚度均匀的高质量自支撑金刚石膜,热导率可达18W/cm·K,厚度为0.7mm,其热导率已接近天然金刚石。
【Abstract】 We have successfully developed a system for deposition of large ared diamond films by DC arc plasma jet operated in gas recycling mode.In the present paper,the influence of substrate temperature,methane concentration,flow rate of feeding gas and the input power of the jet for diamond film deposition is presented. Deposition of large area uniform thickness wafer of φ65mm in diameter at a high growth rate is reported. Thickness of the wafer can be 2. 0mm and the thermal conductivity can be 18. 1W/cm·K.
- 【文献出处】 河北省科学院学报 ,JOURNAL OF THE HEBEI ACADEMY OF SCIENCES , 编辑部邮箱 ,2000年01期
- 【分类号】O484
- 【被引频次】1
- 【下载频次】94