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Ge/GaAs中APD及薄膜性能研究
Study of the property of Ge films and APD of Ge/GaAs
【摘要】 研究了一种光纤通讯用光电探测器。在GaAs上蒸镀800nm的Ge,并在此材料基础上提出了一种吸收倍增分离的雪崩二极管(SAM-APD)的结构设计,采用GaAs作为倍增区,Ge作为吸收区。在此结构上初步制作的二极管正向开启电压为0.2~0.3V,反向击穿电压为2.5V,漏电不明显,p-n结特性良好。
【Abstract】 This work want to fabricate a photodiode used for optical- fiber- transmission system. 800nm Ge was deposited on n type GaAs and a SAM- APD was put forword in this material. GaAs was used as avalanche region , Ge was used as absorbent region .The diode was made on this material , Its positive volage is 0.2- 0.3 V ,opposive volage is 2.5 V . The leak current can’t be observed , the property of p- n junction is well .
【关键词】 Ge/GaAs;
吸收倍增分离;
雪崩光电二极管(APD);
【Key words】 Ge on GaAs; Separate avalanche region and absorbent region; APD;
【Key words】 Ge on GaAs; Separate avalanche region and absorbent region; APD;
【基金】 北京市基金!4992004
- 【文献出处】 功能材料与器件学报 ,JOURNAL OF FUNCTIONAL MATERIALS AND DEVICES , 编辑部邮箱 ,2000年03期
- 【分类号】TN304
- 【下载频次】66