【摘要】 掩模移动技术是一种通过移动掩模调制曝光量的连续面形微光学制作技术 ,其工作的局限性在于该技术对所制元件的对称性要求高 ,因此限制了制作复杂面形的功能。本文从分析掩模移动过程中的边框效应入手 ,阐明了消除这一效应负面影响的办法 ,并利用它来降低掩模移动技术的对称性要求 ,在实验中制作出了面形复杂的连续浮雕微光学元件。更多还原

【Abstract】 Mask moving technique is a fabrication technique for micro-opti cal elements with continuous relief.The exposure is modulated through moving mas k.The operating limit of the technique is that the symmetry requirement of the f abricating elements is high,thus the function for fabricating complicated relief is limited.Starting from analyzing the edge effect during mask moving.the paper describes a method for eliminating the harmful influence of the effect and appl ying the method to reducing the symmetry requirement of mask moving technique.Th e micro-optical elements with complex continuous relieves are fabricated in exp eriments.更多还原