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二元光栅照明对光刻系统成象特性的影响
The Influence of Binary Grating Illumination on Imaging Property of Photolithographic System
【摘要】 针对光刻系统分辨力和焦深的矛盾 ,详细研究了二元光栅照明对硅片上光强以及对光刻系统传输频率的影响 .结果表明 ,二元光栅照明可显著提高光强的对比度 ,改善成象系统的频率传递函数 ,是一种比较理想的离轴照明技术。
【Abstract】 In view of the contradiction between the resolution and focal depth of the photolithographic system,the influence of binary grating illumination on light intensity of the wafer and transmission frequency of the photolithographic system are studied in detail.The results show that the contrast of light intensity and the frequency transfer function of the imaging system can be obviously improved by binary grating illumination.It is an ideal off axis illumination technique.
【关键词】 光刻系统;
二元光栅照明;
成象特性;
光强度;
传递函数;
【Key words】 Photolithographic systems; Binary grating illumination; Imaging characteristics; Luminous intersity; Transfer functions;
【Key words】 Photolithographic systems; Binary grating illumination; Imaging characteristics; Luminous intersity; Transfer functions;
【基金】 国家自然科学基金资助项目! ( 698760 41)
- 【文献出处】 光电工程 ,OPTO-ELECTRONIC ENGINEERING , 编辑部邮箱 ,2000年03期
- 【分类号】TN305
- 【被引频次】3
- 【下载频次】107