【摘要】 介绍了一种非晶硅 (a- Si)薄膜低温晶化的新工艺 :金属诱导非晶硅薄膜低温晶化。研究了各种 a- Si/金属双层膜退火后的晶化情况。利用 X射线衍射分析了结晶硅膜的结构 ,通过光学显微镜观察了 Al诱导 a- Si薄膜晶化后的表面形貌 ,并初步探讨了金属诱导非晶硅薄膜低温晶化的机理更多还原

【Abstract】 Developed is new process for crystallization of amorphous silicon films by metal induced crystallization of amorphous silicon films at low temperature. Crystallization of different a Si/metal films is investigated after annealing. The structure of the thin films of crystalline silicon is analyzed by X ray diffraction. The surface of the Al induced samples is observed by optical microscopy. The mechanism of metal induced crystallization at low temperature is discussed. (5 refs.)更多还原