节点文献
偏压对MPCVD金刚石薄膜织构生长的影响
Effect of bias on texture growth of MPCVD diamond films
【摘要】 通过偏压微波等离子体化学气相沉积法 (MPCVD)成功地在Si(10 0 )上生长出具有 [10 0 ]织构的金刚石薄膜 .阐述了实验过程 ,讨论了偏压对 [10 0 ]织构金刚石薄膜成核与生长条件的影响 ,偏压有助于成核密度的提高和有利于 [10 0 ]织构生长 .采用SEM、Raman光谱等对所得样品进行了表征 .
【Abstract】 Highly textured diamond films [dia(100) on mirror polished Si(100)] have been achieved by microwave plasma assisted (MPCVD). A systematic investigation was made into the effect of growth parameters on the crystallographic perfection of deposited diamond films, and the growth conditions are therefore systematically changed in order to obtain defferent film morphologies, preferential orientations and crystal qualities. The films are characterized by RAMAN、SEM.
【基金】 上海市自然科学基金!( 915 2 11115 )
- 【文献出处】 材料科学与工艺 ,MATERIAL SCIENCE AND TECHNOLOGY , 编辑部邮箱 ,2000年02期
- 【分类号】TB43
- 【被引频次】2
- 【下载频次】115