【摘要】 采用由阴极真空弧等离子体源、负脉冲高压靶台和磁过滤系统组成的金属等离子体浸没注入系统 ,实现Ta+ 和Ti+ 浸没注入 ,并对离子注入层予以表征 .结果表明 ,等离子体浸没离子注入钽和钛的RBS分析射程 ,低于按设定加速电压的注入能量计算的TRIM射程 .更多还原

【Abstract】 A metal plasma immersion ion implantation system has been established. This system contains a vacuum cathode arc metal plasma source, a magnetic filter duct and a negative high voltage bias target. Ta and Ti ion implantation has been performed by this system. RBS is used to characterize the implanted surface layer. The range of implanted ions by RBS is much lower than that by TRIM.更多还原