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多晶硅薄膜晶体管特性的研究
The TFT characteristics of polycrystalline silicon
【摘要】 利用高级二维器件模拟程序MEDICI分析了多晶硅薄膜晶体管有源区的长度、体内陷阱、界面陷阱、栅氧化层厚度等几何参数及物理参数,并研究了这些参数对薄膜晶体管特性的影响
【Abstract】 The effect of a few important geometrical and physical parameters which include the length of the active region,the thickness of the active region,bulk traps,interface traps,on the TFT (Thin Film Transistor) characteristics of polycrystalline silicon has been investigated by using ad- vanced two dimensional device simulation program MEDICI.
- 【文献出处】 宝鸡文理学院学报(自然科学版) ,JOURNAL OF BAOJI COLLEGE OF ARTS AND SCIENCE(NATURAL SCIENCE EDITION) , 编辑部邮箱 ,2000年01期
- 【分类号】TN321.5
- 【被引频次】1
- 【下载频次】298