节点文献
半绝缘InP的优化生长条件以及掩埋的1.55μm激光器
Fe Doped Semi-Insulating InP Buried 1.55μm MQW InGaAsP Laser Diode
【摘要】 研究了低压MOCVD下生长压力和Fe 源/In 源摩尔流量比对半绝缘InP电阻率的影响.得到了用LP-MOCVD 生长掺Fe 半绝缘InP的优化生长条件.在优化生长条件下得到的Fe-InP的电阻率为2.0×108Ω·cm ,击穿电场4×104V/cm .用半绝缘Fe-InP掩埋1.55μm 多量子阱激光器,激光器的高频调制特性明显优于反向pn 结掩埋的激光器,3dB 调制带宽达4.8GHz.
【Abstract】 Fe doped semi\|insulating InP was grown by LP\|MOCVD under different conditions. An optimized growth condition has been obtained after comparing the resistivity of Fe doped semi\|insulating InP of different growth condition. Fe doped semi\|insulating InP with resistivity 2 0×10 8Ω·cm and breakdown field strength 4×10 4V/cm was obtained. The 3dB bandwidth of 1 55μm InGaAsP MQW laser diode buried by Fe doped semi\|insulating InP, was measured to be 4 8GHz.
【基金】 国家“863”高技术计划资助
- 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,2000年02期
- 【分类号】TN241
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