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电子辐照下的SiC少子寿命退化模型

A Model of Minority Carrier Lifetime Degradation in SiC Irradiated by Electron

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【作者】 尚也淳; 张义门; 张玉明;

【Author】 SHANG Ye chun, ZHANG Yi\|men and ZHANG Yu\|ming(Microelectronics Institute, Xidian University, Xi’an 710071, China)Received 22 October 1998, revised manuscript received 16 April 1999

【机构】 西安电子科技大学微电子所!西安710071;

【摘要】 从理论上对电子辐照在4H-SiC中引入的缺陷数量和各种缺陷能级进行了分析.结果表明,EH6 和EH7 缺陷能级在4H-SiC中起着有效复合中心的作用.采用SRH 模型来估计电子辐照下4H-SiC的少子寿命,并给出了电子辐照下4H-SiC少子寿命损伤系数的模型.结合具体的测量条件,证明了这个模型是合理的.辐照电子对Si、GaAs 和4H-SiC产生的不同影响展示了在高空、高辐照条件下SiC存在着优势

【Abstract】 The total number of defects induced by electron irradiation in 4H\|SiC has been calculated theoretically in this paper.The deep level defect of EH6 EH7 is considered to play the most important role in carrier recombination from the comparison of all kinds of possible electron traps.Base on this analysis,SRH model is used to calculate the minority carrier lifetime of 4H\|SiC irradiated by electrons.And then,a model of the minority carrier lifetime damage constant is presented.The model is proved to be reasonable by good match with experimental data.The different effect of electron irradiation on SiC\,Si and GaAs are also compared.The results show the advantage of SiC device used in space system and in the circumstance of radiation.

【关键词】 寿命退化模型; SiC; 电子辐照;
【Key words】 Lifetime Damage Model; SiC; Electron Radiation;
  • 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,2000年02期
  • 【分类号】TN304
  • 【被引频次】13
  • 【下载频次】249
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