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用调制光谱研究半导体体材料及微结构的非线性极化率
Measurement of Nonlinear Susceptibility for Semiconductor Microstructures by Modulation Spectroscopy\+*
【摘要】 提出了用调制光谱信号强度表征半导体体材料及微结构的非线性极化率,研究了测量的原理和方法.对玻璃中量子点电反射调制光谱信号强度随团簇颗粒尺寸的不同而产生几个数量级变化的原因作出了解释
【Abstract】 It is proposed to use the signal intensity of modulation spectra for characterizing the nonlinear susceptibility of bulk semiconductor materials and microstructures.The principle and method of measurement are investigated.The large difference,as high as several orders of magnitude,between the signal intensities of electroreflectance spectra of quantum dots in doped glass with different cluster size is discussed.
【关键词】 极化率;
半导体微结构;
调制光谱;
【Key words】 Susceptibility; Semiconductor Microstructures; Modulation Spectroscopy;
【Key words】 Susceptibility; Semiconductor Microstructures; Modulation Spectroscopy;
【基金】 国家自然科学基金
- 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,2000年01期
- 【分类号】TN304.01
- 【下载频次】85