【摘要】 对多靶离子溅射制备的Nb/Si周期多层膜的微结构进行了实验研究。利用X射线衍射和截面透射电子显微镜观测到室温和 56 0℃沉积的Nb/Si多层膜为非晶多层膜 ,但它们的微结构有很大的不同。采用沉积原子表面活动性和界面反应程度解释了所得到的结果。更多还原

【Abstract】 The microstructures of Nb/Si multilayers prepared by ion beam sputtering technique have been studied by using XRD and CTEM.The XRD and CTEM observations demonstrate that significant differences in film morphology emerge for samples deposited at room temperature and 560 ℃ respectively .It is surface mobility of adatoms and interfacial reaction that play an important role in the growth of amorphous Nb/Si multilayers.更多还原