节点文献
真空电弧沉积技术中的弧源设计
Arc Source Design in Vacuum Arc Deposition
【摘要】 讨论了真空电弧沉积中弧源设计的有关问题 ,如电弧运行模式、电弧极性、点火方式、电弧的约束方式以及宏观粒子抑制方式等。分析表明 ,合理选择电弧运行模式和电弧极性 ,以满足涂料粒子蒸发与离化的要求 ;选择合适的弧源结构 ,加强对电弧的约束与烧蚀的控制 ,或用过滤弧源 ,以抑制宏观粒子对涂层的污染 ,是成功设计弧源的关键
【Abstract】 Several technical problems in arc source design,including arc mode,arc polarity,ignition mechanism and arc confinement and macroparticle reduction were discussed.Successful design of a high quality arc source depends on a number of factors.For instance,arc mode and arc polarity strongly affect evaporation and ionization of the coating particles;appropriate arc source structures may considerable enhance arc tract control and reduce erosion;incorporation of a macroparticle filter may effectively lessen macroparticle contamination of the coating.
- 【文献出处】 真空科学与技术 , 编辑部邮箱 ,1999年02期
- 【分类号】TN105
- 【被引频次】7
- 【下载频次】193