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离子束增强沉积工艺参数对Cr-N膜层组织结构的影响
Influence of IBED Testing Parameters on Cr N Coating Structure
【摘要】 利用离子束增强沉积技术, 在 Si (111) 和 G Cr15 轴承钢基体上沉积 Cr N 镀层研究氮分压、 N+ + N+2 离子轰击能量和 Nions Cr atoms 到达比对镀层组织结构的影响结果表明, Cr N 镀层组织对氮分压敏感, 随着氮分压的增加, 镀层中 Cr N 组份增加, 金属 Cr 及 Cr2 N 组份减少; 随着氮离子轰击能量的增加, Cr N 镀层中 Cr N (200) 择优生长; 但当 Nions Cr atoms 比从145 ×10 - 2 增至587 ×10 - 2 时, 镀层中 Cr N 组份非但没有增多, 反而使镀层中的 Cr 以 Cr2 O3 形态存在
【Abstract】 This paper studies the structure of IBED Cr N coatings with different parameters such as N partial pressure, N ions bombarding energy and N ions/Cr atoms ratio The results show that the chemical composition and structure of the coatings are mainly determined by N partial pressure According to N partial pressure increasing, there are an increase of CrN phase and a decrease of Cr and Cr 2N phase The grain orientations of the coatings are affected by bombarding energy When N ions/Cr atoms ratio changed from 1 45×10 -2 to 5 87×10 -2 , high N ion flux of bombarding will result in acceleration of sputtering away from the coated CrN layer as well as its decomposition In the mean time Cr 2O 3 is easy to be produced in the layer
- 【文献出处】 无机材料学报 ,JOURNAL OF INORGANIC MATERIALS , 编辑部邮箱 ,1999年04期
- 【分类号】TG174.444
- 【被引频次】7
- 【下载频次】100