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新型SiO-Ta2O5复合介质薄膜电容器的研究
Study of new SiO-Ta2O5 compound dielectric film capacitors
【摘要】 研制出一种新型SiO-Ta2O5复合介质薄膜电容器,复合介质膜是用溅射法将SiO和Ta2O5材料溅射在微晶玻璃片上形成的,其下电极Al和上电极Au是用蒸发法制备的.这种电容器具有耐压强度高、损耗小、漏电低、精度高、稳定性好、合格率高等特点.
【Abstract】 A new SiO-Ta2O5 campound dielectric film copacitors was developed. The SiO- Ta2O5 film isgrowed on the plate of micro-crystal glass by sputter method. Its two electrodes are Al and Auelectrodes. Which are formed by evaporating method. The capacitors have some advantages, such aslow power and low leakage current, high precision and stability.
- 【文献出处】 沈阳工业大学学报 ,JOURNAL OF SHENYANG POLYTECHNIC UNIVERSITY , 编辑部邮箱 ,1999年05期
- 【分类号】TN605
- 【下载频次】119