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不同衬底材料上金刚石薄膜成核特点的研究
Study on the Diamond Film Nucleation Feature of Different Substrate Materials
【摘要】 研究了金刚石薄膜在 W C6 % Co 硬质合金、金属 W 和单晶 Si 片上的成核特点。实验结果表明,金刚石薄膜在上述衬底材料上的成核特点和成核机制不同。用于衬底研磨预处理的金刚石微粉粒度对金刚石在单晶 Si 片上的成核密度有较大影响,而对在 W C6 % Co 硬质合金和金属 W 上的成核密度没有太大影响。
【Abstract】 The nucleation feature of diamond films on W and WC 6%Co cemented carbide and single crystal silicon substrates has been studied.And the experimental results show that diamond films nucleation feature and mechanism are different on different above mentioned substrate materials.The influence of micro powder grain size of diamond used to substrate abrasive surface pretreatment on the diamond nucleation density is large on single crystal silicon substrate,but it is not too large on W and WC 6%Co cemented carbide.
【关键词】 金刚石薄膜;
成核密度;
衬底材料;
化学气相沉积;
【Key words】 diamond film; nucleation density; substrate material; chemical vapor deposition;
【Key words】 diamond film; nucleation density; substrate material; chemical vapor deposition;
- 【文献出处】 人工晶体学报 ,JOURNAL OF SYNTHETIC CRYSTALS , 编辑部邮箱 ,1999年03期
- 【分类号】O484
- 【被引频次】4
- 【下载频次】122