【摘要】 对采用化学气相沉积法（ＣＶＤ法）制备的硅镀膜玻璃组成、结构、光学性能、化学稳定性等方面作了系统研究，发现随着反应气中乙烯与硅烷的体积比由０．２增大到１．３，薄膜组成中碳化硅含量增加，结晶数目和结晶程度增高，薄膜透过率提高，耐碱性提高．结果表明：在反应温度６３０°Ｃ，ＳｉＨ４体积分数１０％左右，Ｃ２Ｈ４与ＳｉＨ４的体积比为０．５，反应混合气流量为４００ｍＬ／ｍｉｎ的工艺条件下制备得到的镀膜玻璃具有Ｓｉ／ＳｉＣ纳米镶嵌复合结构、良好的遮阳性能和外观、较好的化学稳定性，达到了实际应用的要求．更多还原

【Abstract】 The composition, structure, optical property and chemical durability of glass coated with silicon by chemical vapor deposition have been studied. With the increasing ratio of V (C 2H 4)/ V (SiH 4) from 0.2 to 1.3, the transmission index and chemical stability are both raised owing to the increasing content of SiC and better crystallization in the film. A series of suitable parameters for excellent property of the film in both optical and chemical aspects are therefore given as below: reaction temperature 620～640 °C , concentration of SiH 4 about 10%, V (C 2H 4)/ V (SiH 4)= 0.5, reaction gaseous mixture flow rate of 400 mL/min.更多还原