【摘要】 介绍了电子回旋共振等离子体化学气相沉积（简称ECRplasmmaCVD）法淀积980nm大功率半导体激光器两端面光学膜的工艺条件，探索了膜系监控的方法和优越性，讨论了这种淀积方法的优点和淀积的光学膜的优良特性。更多还原

【Abstract】 This paper introduces the technology of optical thin films formation by electroncyclotron resonance pthema chemical vapor deposition (ECR plasma CVD) for 980 nm high-Power semiconductor laser devices. A monjforing control method of optical thin filmsproduction is studied and the advantages of the deposition technique and the remarkablecharacteristics of the films are discussed.更多还原