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真空阴极弧离子镀类金刚石碳膜

Preparation of DLC Films by Vacuum Cathodic Arc Deposition

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【作者】 李刘合夏立芳马欣新孙跃

【Author】 Li Liuhe Xia Lifang Ma xinxin Sun Yue (School of Materials Science and Engineering, HIT)

【机构】 哈尔滨工业大学材料学院

【摘要】 采用真空阴极弧离子镀的方法,以乙炔和氢气分别作工作介质,以氩气为稀释气体,研究了类金刚石碳(DLC)膜的制备工艺及其结构和硬度.喇曼光谱分析表明,所得膜为典型的DLC膜,表现为一个波数在1300~1700cm-1的宽峰,工艺不同,喇曼光谱曲线的形状也略有变化.SEM分析表明所得DLC膜结构致密光滑.纳米探头硬度表明,DLC膜表面硬度均高于10GPa.

【Abstract】 This paper deals with diamond like carbon (DLC) films deposited by vacuum cathodic arc deposition in which the H 2 or C 2H 2 was used as feed gas and the Ar was used as background gas. We have investigated the cross section of the DLC films using SEM (scanning electronic microscope). The nano indent micro hardness show the films have very high hardness. The Raman shifts of DlC films have wide peaks between the wave number of 1300cm -1 and 1700cm -1 , and have little deference deposited in different environments.

  • 【文献出处】 哈尔滨工业大学学报 ,JOURNAL OF HARBIN INSTITUTE OF TECHNOLOGY , 编辑部邮箱 ,1999年01期
  • 【分类号】TG154.5
  • 【被引频次】16
  • 【下载频次】252
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