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RIE精确传递微光学三维结构于红外材料的方法

THE METHOD FOR TRANSFERRING MICRO OPTICAL PROFILE INTO GERMANIUM ACCURATELY BY RIE

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【作者】 邱传凯杜春雷潘丽曾红军王永茹

【Author】 Qiu Chuankai,Du Chunlei,Pan Li,Zeng Hongjun,Wang Yongru State lab of Optical Technologies for Microfabrication,Institute of Optics and Electronics, Chinese Academy of Sciences,Chengdu 610209 Received date:1999-04-26

【机构】 中国科学院光电技术研究所微细加工光学技术国家重点开放实验室!成都610209中国科学院光电技术研究所微细加工光学技术国家?

【摘要】 本文对红外光学材料锗的蚀刻性能、机制进行了深入的研究,在反应离子蚀刻(RIE)实验基础上,建立了锗材料蚀刻性能与RIE工艺参量的关系,经过大量的实验,找到了稳定蚀刻速率的方法和条件,为用RIE技术形成高精度衍射微光学元件积累了实用经验

【Abstract】 The etching mechanism and properties for germanium has been studied in this paper.A relationship between material properties and etching parameters was established.An optimizing technique method has been proposed based on a lot of experiment results,5% of the etching rate repeatability was achieved for germainum.A micro optical elements of 16 phase steps was fabricated with accurate phase depth.

  • 【文献出处】 光子学报 ,ACTA PHOTONICA SINICA , 编辑部邮箱 ,1999年09期
  • 【分类号】TN213
  • 【被引频次】2
  • 【下载频次】70
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