【摘要】 本文对红外光学材料锗的蚀刻性能、机制进行了深入的研究，在反应离子蚀刻（ＲＩＥ）实验基础上，建立了锗材料蚀刻性能与ＲＩＥ工艺参量的关系，经过大量的实验，找到了稳定蚀刻速率的方法和条件，为用ＲＩＥ技术形成高精度衍射微光学元件积累了实用经验更多还原

【Abstract】 The etching mechanism and properties for germanium has been studied in this paper.A relationship between material properties and etching parameters was established.An optimizing technique method has been proposed based on a lot of experiment results,5% of the etching rate repeatability was achieved for germainum.A micro optical elements of 16 phase steps was fabricated with accurate phase depth.更多还原