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高压及热处理对氮碳薄膜激光诱导荧光效率的影响

EFFECTS OF HIGH PRESSURE AND THERMAL TREATMENTS ON PHOTOLUMINESCENCE EFFICIENCY OF CN x FILMS

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【作者】 赵菁车荣钲徐积仁康宁刘景杨洋

【Author】 Zhao Jing 1, Che Rongzheng 2, Xu Jiren 2, Kang Ning 2, Liu Jing 1, Yang Yang 1 (1.Beijing Synchrotron Radiation Laboratory,Institute of High Energy Physics, Chinese Academy of Sciences,Beijing 100039) (2.Institute of Physics,Chinese Academy of S

【机构】 中国科学院高能物理研究所同步辐射实验室!北京100039中国科学院物理研究所!北京100080

【摘要】 应用激光激发荧光光谱实验对经热处理后及高压条件下的氮碳薄膜荧光光谱进行了测量分析。实验显示,热处理效应和高压效应均导致薄膜荧光效率降低,前者表现为不可恢复,后者为可恢复即卸压后荧光效率的恢复,表明导致荧光光谱效率降低的微观机制不同,为氮碳薄膜荧光模型提供了新的实验证据。

【Abstract】 Laser induced photoluminescence of carbon nitride films was measured under high pressures up to 24GPa and after thermal treatment at different temperatures.The experimental results show that both effects of thermal treatment and high pressure induce the decrease of photoluminescence strength,but the former is non recoverable while the later recoverable after release of pressure to ambient atmosphere.The two kinds of quenching of photoluminescence are attributed to different mechanism.Our results supply a further experimental evidence to support the active PL center model of the undistorted aromatic sp 2 cluster with various size and embedded in sp 3 bond matrix.

【基金】 国家自然科学基金
  • 【文献出处】 高压物理学报 ,CHINESE JOURNAL OF HIGH PRESSURE PHYSICS , 编辑部邮箱 ,1999年03期
  • 【分类号】O521
  • 【被引频次】1
  • 【下载频次】44
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