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温梯法生长φ110mm×80mm蓝宝石晶体位错的化学腐蚀形貌分析
THE CHEMICAL ETCHING DISLOCATION TOPOGRAPHES ANALYSIS OF Al2O3 SAPPHIRE (φ110 mm×80 mm) GROWN BY TGT
【摘要】 利用导向籽晶温度梯度法(TGT) 生长了110 m m ×80 m m 的蓝宝石单晶,应用化学腐蚀、光学方法分析了该晶体不同部位、不同切片的位错腐蚀形貌、位错密度及其分布情况,发现在晶体放肩处的(1120) 面位错密度约为104 cm - 2 量级,等径生长过程中靠近晶体中心处(0001) 面位错密度为(3 ~4) ×103cm -2 ,靠近坩埚壁处(0001) 面晶体位错密度为(5 ~6) ×103cm -2 . 用同样方法分析了提拉法(Cz) 生长的50 mm ×80 m m 蓝宝石晶体的位错. 相比而言,TGT法生长的Al2O3 位错密度比Cz 法的Al2O3 晶体低得多,约低一个数量级,TGT 法可以生长大尺寸、高完整性的Al2O3 晶体,这与TGT 法的特殊生长工艺有密切关系.
【Abstract】 The monocrystalline Al 2O 3 sapphire with 110 mm in diameter and 80 mm in height was grown by the TGT(temperature gradient technique). The chemical etching pits, dislocation density and profile from various specimens were studied by the chemical etching experiment and under the optical microscope Leitz. The central position in the as_grown crystal has the lowest dislocation density (3~4)×10 3 cm -2 ,followed by the other in the neighbourhood of the Mo crucible wall with the dislocation density (5~6)×10 3 cm -2 , while the highest dislocation density about 10 4 cm -2 exists close to the seed. In contrast to the Cz monocrystalline sapphire, the Al 2O 3 sapphire grown by TGT has about one tenth of the average dislocation density, showing the higher integrity. This feature depends on the specific growth condition in the TGT apparatus.
【Key words】 temperature gradient technique; alumina; dislocation etching pits; crystal growth;
- 【文献出处】 硅酸盐学报 ,JOURNAL OF THE CHINESE CERAMIC SOCIETY , 编辑部邮箱 ,1999年06期
- 【分类号】O772
- 【被引频次】32
- 【下载频次】502