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HBT中基区内建电场的物理机制及其理论分析

Physical Mechanism and Simulations of Base Built in Electric Field for SiGe Base HBT witha Linearly Graded Ge Profile

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【作者】 孔德义; 魏同立; 李垚; 聂卫东;

【Author】 Kong Deyi Wei Tongli Li Yao Nie Weidong (Microelectronics Center of Southeast University, Nanjing, 210096, CHN)

【机构】 东南大学微电子中心!南京; 210096;

【摘要】 计算了具有线性Ge 分布的SiGe 基区价带有效态密度和空穴浓度的分布,分析了基区内建电场的物理机制,分别采用Boltzm ann 统计和Ferm iDirac统计给出了内建电场分布的表达式并进行了计算,最后讨论了基区重掺杂对电场的影响

【Abstract】 In this work, distributions of valence band effective states density and hole density have been calculated for a SiGe base with linearly graded Ge profile and physical mechanism of base built in electric field has been analyzed. From Boltzmann statistics and Fermi Dirac statistics, expressions of the electric field have been presented and simulated. Finally, influence of high doping level in base on built in electric field has been discussed.

  • 【文献出处】 固体电子学研究与进展 ,RESEARCH & PROGRESS OF SOLIA STATE ELECTRONICS , 编辑部邮箱 ,1999年03期
  • 【被引频次】4
  • 【下载频次】71
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