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InGaP/GaAs异质结价带不连续性的直接测量
Direct Measurement of Valence band Discontinuity of InGaP/GaAs Heterojunction
【摘要】 用Keithley S900A 型半导体自动参数测试仪测量了用MOCVD方法生长的InGaP/GaAs异质结样品的界面CV的分布。用多项式逐段拟合的方法,转化得到界面浓度的分布,最后计算得到该体系的价带不连续性ΔEv 为316 m eV,约相当于0.69 ΔEg
【Abstract】 The C V profile of InGaP/GaAs heterojunction grown by MOCVD method has been measured by Keithley S900A semiconductor parametric test system. After transfering it to the hole interface concentration profile by polynomial sectional curve fitting method, we finally obtained the calculated valence band discontinuity Δ E v=316 meV, corresponding to about 0.69 Δ E g.
【关键词】 铟镓磷砷化镓;
异质结界面;
价带不连续性;
界面固定电荷密度;
电容电压技术;
【Key words】 InGaP/GaAs Heterojunction Interface Valence band Discontinuity Interface Fixed Charge Density C V Technique;
【Key words】 InGaP/GaAs Heterojunction Interface Valence band Discontinuity Interface Fixed Charge Density C V Technique;
【基金】 国家自然科学基金
- 【文献出处】 固体电子学研究与进展 ,RESEARCH & PROGRESS OF SOLIA STATE ELECTRONICS , 编辑部邮箱 ,1999年03期
- 【分类号】TN304.052;TN304.07
- 【被引频次】1
- 【下载频次】49