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CVD金刚石薄膜的介电性能研究
Study on the Dielectric Properties of Diamond Thin Film Prepared by Chemical Vapor Deposition
【摘要】 对直流电弧等离子体CVD制备的金刚石薄膜的介电性能进行了研究,结果表明,金刚石薄膜的介电性能主要取决于样品的多晶性质以及表面和晶界处的非金刚石相和杂质成分
【Abstract】 Dielectric properties of diamond thin film prepared by dc arc plasma CVD have been studied.It indicates that the dielectric properties of diamond film depends mainly on its polycrystalline nature,and the presence of nondiamond phase and impurities on the surface and between diamond grains of the film.
【关键词】 金刚石薄膜;
直流电弧等离子体CVD;
介电性能;
【Key words】 diamond thin film; dc arc plasma CVD; dielectric properties;
【Key words】 diamond thin film; dc arc plasma CVD; dielectric properties;
【基金】 863计划资助项目
- 【文献出处】 功能材料 ,JOURNAL OF FUNCTIONAL MATERIALS , 编辑部邮箱 ,1999年02期
- 【分类号】TN304.1
- 【被引频次】4
- 【下载频次】96