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双咪唑光敏体系紫外光引发聚合甲基丙烯酸甲酯动力学和应用研究
KINETIC AND APPLIED STUDY OF UV LIGHT PHOTOSENSITIVEINITIATING POLYMERIZATION OF METHYLMETHACRYLATEBY BIIMIDAZOLE PHOTOSENSITIVE SYSTEM
【摘要】 用光敏剂4,4′二(N,N′二甲基氨基)苯甲酮(简称米氏酮,MK)、引发剂邻氯代六芳基双咪唑(oClHABI)和氢给体助引发剂十二烷基硫醇(SH)组成光敏引发体系.研究了在高压汞灯照射下,甲基丙烯酸甲酯(MMA)光聚合速率和该敏化体系每一个组分,包括MK、oClHABI、SH和MMA的关系,还研究了该体系在PS版材上的应用,并获得了很好的效果
【Abstract】 The ultraviolet photosensitive initiating system is composed of 4,4’bis(N,N’dimethylamino) benzophenone (MK), 2chlorohexaarylbiimidazole (oClHABI) and a hydrogen donor coinitiator ndodecyl mercaptan (SH). Under the irradiation by high pressure mercury lamp, the relationship between the photopolymerization rate of MMA and the concentration of each component of the system, including MK, oClHABI, SH and MMA, was studied. The excellent results have been obtained through studying the system’s application on PS printing plate.\=
【关键词】 双咪唑;
光聚合;
光敏引发体系;
【Key words】 biimidazole; photopolymerization; photosensitive initiating system;
【Key words】 biimidazole; photopolymerization; photosensitive initiating system;
【基金】 国家自然科学基金
- 【文献出处】 感光科学与光化学 ,PHOTOGRAPHIC SCIENCE AND PHOTOCHEMISTRY , 编辑部邮箱 ,1999年03期
- 【分类号】TQ571
- 【被引频次】12
- 【下载频次】199