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用光电灵敏度法研究a-Si:H中的电荷放大效应
INVESTIGATION OF CHARGE INTENSIFICATION EFFECT IN a-Si:H BY MEANS OF PHOTOELECTRIC SENSITIVITY METHOD
【摘要】 测量了缝电极和梳形电极a-Si:H样品的光伏安特性和光电灵敏度,提出了由光电灵敏度计算电荷放大增益的方法。由此法测出的a-Si:H的电荷放大增益,在10~5V/cm电场下,高达4.3×10~3。本文从能态图讨论了a-Si:H中电荷放大效应的产生过程。由测量的增益值计算了电子迁移率与寿命之积。
【Abstract】 The photocurrent-voltage characteristics and photoelectric sensitivity of a-Si:H samples with slit and comb electrodes are measured. A method for calculating the charge intensifying gain from the photoelectric sensitivity is proposed. The obtained charge intensifying gain of a-Si:H under an electric field of 105 V/cm with this method is as high as 4.3×103. The generation process of the charge intensification effect in a-Si:H is discussed on the basis of the energy level diagram. And the product of electron’s mobility and its lifetime is calculated from the measured values of the gains.
【Key words】 a-Si:H; Semiconductor; Charge intensification effect; Photoelectric sensitivity method;
- 【文献出处】 电子科学学刊 , 编辑部邮箱 ,1999年05期
- 【分类号】TN202
- 【下载频次】57