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用光电灵敏度法研究a-Si:H中的电荷放大效应

INVESTIGATION OF CHARGE INTENSIFICATION EFFECT IN a-Si:H BY MEANS OF PHOTOELECTRIC SENSITIVITY METHOD

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【作者】 海宇涵; 海灏; 奚中和; 张蔷;

【Author】 Hai Yuhan Hai Hao Xi Zhonghe Zhang Qiang(Institute of Ecletronics,Academia Sinica,Beijing 100080)(Nankai University,Tianjin 300071) (Peking University,Beijing 100871)(Beijing United University,Beijing 100101)

【机构】 中国科学院电子学研究所; 南开大学; 北京大学; 北京联合大学 北京 100080; 天津 300071; 北京 100871; 北京 100101;

【摘要】 测量了缝电极和梳形电极a-Si:H样品的光伏安特性和光电灵敏度,提出了由光电灵敏度计算电荷放大增益的方法。由此法测出的a-Si:H的电荷放大增益,在10~5V/cm电场下,高达4.3×10~3。本文从能态图讨论了a-Si:H中电荷放大效应的产生过程。由测量的增益值计算了电子迁移率与寿命之积。

【Abstract】 The photocurrent-voltage characteristics and photoelectric sensitivity of a-Si:H samples with slit and comb electrodes are measured. A method for calculating the charge intensifying gain from the photoelectric sensitivity is proposed. The obtained charge intensifying gain of a-Si:H under an electric field of 105 V/cm with this method is as high as 4.3×103. The generation process of the charge intensification effect in a-Si:H is discussed on the basis of the energy level diagram. And the product of electron’s mobility and its lifetime is calculated from the measured values of the gains.

【基金】 国家自然科学基金(批准号 69676016)
  • 【分类号】TN202
  • 【下载频次】57
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