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铁电/超导集成膜和铁电多层膜的TEM研究

TRANSMISSION ELECTRON MICROSCOPY STUDY OF FERROELECTRIC/SUPERCONDUCTOR INTEGRATED FILMS AND FERROELECTRIC MULTILAYER FILMS

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【作者】 刘维

【Author】 Liu Wei Institute of Physics & Center for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 10080 (

【机构】 中国科学院物理研究所中国科学院凝聚态物理中心

【摘要】 报道了用透射电子显微镜对单层YBCO薄膜,PZT/YBCO集成薄膜,STO/GBCO集成薄膜和STO/BTO超晶格薄膜等四种有代表性的薄膜样品的研究结果.在单层YBCO平面样品中观察到镶嵌,在生长在YBCO/STO上面生长的PZT薄膜中,观察到柱状结构.用PLD方法生长的STO/GBCO,YSZ集成薄膜中缺陷很少.虽然GBCO膜的表面并不平整,但仍能生长出c取向的GBCO薄膜.用MBE方法生长的STO/BTO多层膜具有很好的外延特征.由于晶格匹配和层状生长机制所以具有锐的界面.这些结果对改进铁电超导集成薄膜和多层膜制备工艺是有用的

【Abstract】 Abstract Four representative samples of single layer YBCO film, PZT/YBCO integrated film, STO/GBCO integrated film and the STO/BTO multilayer films studied by TEM were reported. The PTEM of single layer YBCO film shows a Marquetry like structure. The PZT film grown on YBCO/STO shows a ‘columnar structure’, which is interpreted as a strained single crystalline film. STO/GBCO/YSZ grown by PLD method has much less defects in the films, but the surface of GBCO film is not smooth, which was conjectured due to the spiral growth mode of the c axis GBCO film. The STO/BTO multilayer films grown by L MBE method has an epitaxial characteristic with sharp interfaces. It is due to the close lattice matching and the layer by layer growth. Evidently helpful results are obtained for optimizing the fabrication process of ferroelectric/superconductor integrated films and multilayer filmss.

  • 【文献出处】 低温物理学报 ,CHINESE JOURNAL OF LOW TEMPERATURE PHYSICS , 编辑部邮箱 ,1999年01期
  • 【分类号】TM26,TM26
  • 【下载频次】113
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