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中温化学镀镍工艺研究

Study of Electroless Nickel Plating at Medium Temperature

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【作者】 李卫东李良超尹业高赵元力

【Author】 LI WeidongLI LiangchaoYIN YegaoZHAO Yuanli

【机构】 湖北荆州师专化学系

【摘要】 通过正交试验优选出一种较佳的中温化学镀镍工艺。研究了镀液主要成分及操作条件对沉积速度和镀层质量的影响。利用X射线衍射法测定了镀层组成和晶体结构,并测量了其耐蚀性。结果获得含磷106wt%的非晶态镀层,耐蚀性优于光亮镀镍层

【Abstract】 A preferred process of electroless nickel plating at medium temperature was optimized by orthogonal test.The effect of bath composition and operating conditions on deposition rate and properties of the deposits was studied.The composition and microstructure of the deposits were measured by means of X-ray diffraction, corrosion resistance was compared with that of bright nickel electrodeposits by immersing in 1:1(volume ratio) hydrochloric acid and 65% nitric acid solutions.Amorphous nickel deposits were obtained containing 10.6 wt% of phosphorus. The results of corrosion test indicate that the obtained nickel deposits are greatly improved in corrosion resistance compared with bright nickel electrodeposits.

  • 【文献出处】 电镀与涂饰 ,ELECTROPLATING & FINISHING , 编辑部邮箱 ,1999年01期
  • 【分类号】TQ153.12
  • 【被引频次】6
  • 【下载频次】84
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