节点文献

ZnO压敏电阻片残压比与微观结构参数的关系

Correlation between Residual Voltage Ratio and Microstructure Parameters of ZnO Varistors

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 李盛涛谢峰刘辅宜

【Author】 State key laboratory of Electrical Insulation for power Equipment, Xi′an Jiaotong University Li Shengtao XieFeng Liu Fuyi (Xi′an 710049)

【机构】 西安交通大学电力设备电气绝缘国家重点实验室!西安710049

【摘要】 实验研究了厚度d 对ZnO压敏电阻片残压比Kr 的影响规律, 表明残压比同样存在几何效应;实验还表明残压比Kr 随电位梯度E1m A成反比例下降,随平均晶粒尺寸μ的增大而增大; 找到了一个综合微观结构参数 平均晶粒尺寸μ和晶粒尺寸方差σ2 的乘积(σ2μ), 能较好地反映电性能与微观结构参数的关系。提出了计算机模拟微观结构模型,并用计算机模拟了残压比Kr 和厚度d、Kr 和平均晶粒尺寸μ以及Kr 和乘积σ2μ的关系, 模拟结果与实验结果基本一致

【Abstract】 The influence of thickness d of ZnO varistors on the residual voltage ratio K \-r has been experimentally studied.It is showed that K \-r also has dimensioned effect. The results show that there is a residual voltage ratio K \-r decreases propor tonally with E \- 1mA ,and increase μ as grain mean size.A synthetic microtructure parameter product of mean grain size μ and quadrate variation σ\+2 (σ\+2μ) was established which can reflect the corelation of electrical properties and microstructure parameters Amicrostructure simulation model was proposed and used to simulate the relations between K \-r and d , K \-r and μ as wellas K \-r and σ\+2μ.The simulated results are consistent with experimental ones

【基金】 国家自然科学基金
  • 【文献出处】 电瓷避雷器 ,INSULATORS AND SURGE ARRESTERS , 编辑部邮箱 ,1999年05期
  • 【分类号】TN304.21
  • 【被引频次】11
  • 【下载频次】325
节点文献中: 

本文链接的文献网络图示:

本文的引文网络