【摘要】 在分析 Ｃ Ｖ Ｄ 法渗 Ｓｉ 制备 Ｆｅ６５ ％ Ｓｉ 合金薄板的实际工艺要求基础上，择定了母材的 Ｓｉ含量、扩散温度及气氛浓度·利用计算机模拟研究了在所确定条件下对一定厚度样品实施单步扩散和两步扩散的最佳处理工艺·模拟计算结果与实验符合较好·更多还原

【Abstract】 The chemical vapor deposition (CVD) method has shown potential to the preparation of Fe 6 5%Si alloy thin sheets. A computer simulation was made on the CVD processing according to possible industrial requirements of the deposition and diffusion technics by varying the conditions including initial Si content in the matrix Fe Si alloy, composition of atmosphere and deposition temperature.The simulation on the one step diffusion scheme was compared with that on the two step diffusion scheme. It has been shown that the two step scheme may reduce the diffusion time by 35% than the one step scheme. Commercial cold rolled Fe 3%Si sheet was used to make the Fe 6.5%Si sheets experimentally by the two step scheme, which confirms the validity of the present computer simulation.更多还原