【摘要】 用等离子体基脉冲偏压技术制备了ＤＬＣ（ 类金刚石碳） 膜，ＤＬＣ 膜硬度值达３０ＧＰａ， 电阻值达１００ＭΩ以上．降低脉冲负偏压峰值及适量引入氢气可促进ＳＰ３ 结构的形成，但氢气量超过一定阈值后ＳＰ２ 束片尺寸细化，ＳＰ２ 键含量有增加的趋势．在ＧＣｒ１５ 轴承钢基体上经磁控溅射沉积约３００ｎｍ 纯Ｔｉ 层，再用脉冲偏压技术沉积ＤＬＣ膜的改性层，在ＤＬＣ膜与ＧＣｒ１５ 钢基体之间形成了ＣＴｉ 成分渐变的梯度层．更多还原

【Abstract】 DLC (diamond like carbon) films were prepared using plasma based pulsed bias technique. X ray photoelectron spectroscopy (XPS) was used to analyze the composition of the DLC films and the transition layer between film and substrate. The structures of the DLC films were characterized by Raman spectroscopy, electrical resistance and hardness. High quality DLC films which have near 30GPa of hardness, and above 100MΩ of electrical resistance can be prepared by the plasma based pulsed bias technique. The feature of Raman spectra imply that the SP 3 sites was promoted as the peak value of the minus pulsed bias decreases and just the right amount of H 2 gas was led in the deposition gas. As the H 2 flow ratio in deposition gas is higher than the threshold value, the SP 2 clusters size decrease and the SP 2 fraction increased. A pure titanium layer of 300nm was deposited on the bearing steel GCr15 by magnetron sputtering, and a DLC film was coated subsequently by plasma based pulsed bias technique. This caused the C Ti transition layer in which the composition changed gradually formed between the substrate and DLC film.更多还原