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NiFe/Cu和NiFe/Mo多层膜的界面结构与巨磁电阻

INTERFACE STRUCTURE AND GIANT MAGNETORESISTANCE IN NiFe/Cu AND NiFe/Mo MULTILAYERS

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【作者】 郑鹉王艾玲周安陈金昌王岩国周少雄

【Author】 ZHENG Wu; WANG Ailing; ZHOU An; CHEN Jinchang;WANG Yanguo;ZHOU Shaoxiong

【机构】 首都师范大学加拿大阿尔伯特大学国家非晶微晶合金工程技术研究中心

【摘要】 用磁控溅射方法制备了NiFe/Cu和NiFe/Mo多层膜.测量了厚度不同的Cu层和Mo层多层膜的磁性和磁电阻,并用电镜分析了部分NiFe/Cu多层膜样品测量到NiFe/Cu多层膜的室温巨磁电阻随Cu层厚度振荡的第一、二、三峰而在NiFe/Mo多层膜中未发现巨磁电阻效应讨论了多层膜的界面结构对巨磁电阻效应的影响.

【Abstract】 The NiFe/Cu and NiFe/Mo multilayers (MLs) were deposited by dc magnetronsputtering. The magnetoresistance and the magnetism of the MLs were measured, and the crosssectional images of the NiFe/Cu M Ls were analyzed by transmission electron microscopy (TEM). Thethree peaks of MR ratio for NiFe/Cu MLs were observed at room temperature as the thickness of Culayer was varied, while no MR of NiFe/Mo MLs was found with the varied thicknesses of Mo. Thedependence of GM R on interface structure was studied.

【基金】 北京市自然科学基金!1962003
  • 【文献出处】 材料研究学报 ,CHINESE JOURNAL OF MATERIAL RESEARCH , 编辑部邮箱 ,1999年02期
  • 【分类号】O484
  • 【被引频次】3
  • 【下载频次】115
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