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溅射富Ti-TiNi形状记忆合金薄膜
Sputtered Thin Films of TiRich TiNi Shape Memory Alloy
【摘要】 采用X射线衍射(XRD)、透射电子显微镜(TEM)和电阻-温度曲线等方法研究了近等原子的富TiTiNi合金薄膜的析出相和相变等特征,并对结果进行了详细讨论。
【Abstract】 Some features of precipitated phases and phase transformation in thin films of the Tirich TiNi alloy have been using Xray diffraction,transmission microscopy and resistance transition method. The results are discussed in detail.
【关键词】 溅射;
TiNi形状记忆合金;
薄膜;
【Key words】 precipiated phase; phase transformation; sputter; TiNi shape memory alloy;
【Key words】 precipiated phase; phase transformation; sputter; TiNi shape memory alloy;
- 【文献出处】 稀有金属材料与工程 ,RARE METAL MATERIALS AND ENGINEERING , 编辑部邮箱 ,1999年02期
- 【分类号】TG139.6
- 【被引频次】16
- 【下载频次】132