节点文献
NiFe/Cu多层膜的热处理研究
A Annealing Study on NiFe/Cu Multilayers
【摘要】 针对用磁控溅射方法制备的NiFe/Cu多层膜进行了热处理研究。经退火后,NiFe/Cu多层膜的磁电阻有了显著的变化,在250℃的最佳退火温度下,最大磁电阻变化率为5.2%。
【Abstract】 The magnetoresistive (MR) properties of sputtered NiFe/Cu multilayers (MLs) have been investigated as a function of thermal treatments. The MR of the NiFe/Cu MLs were improved with annealing treatments. Annealing at 250℃ results in a maximum MR ratio of up to 5.2%. In addition, the MR-H curves are found to be perfectly linear and reversible.
【关键词】 多层膜;
巨磁电阻;
层问耦合;
热处理;
【Key words】 multilayers; gaint magnetoresistive; interlayer coupling; annealing;
【Key words】 multilayers; gaint magnetoresistive; interlayer coupling; annealing;
【基金】 北京市自然科学基金(No.1962003);北京市教委科学研究与发展研究计划项目
- 【文献出处】 材料导报 ,Materials Review , 编辑部邮箱 ,1999年05期
- 【分类号】TG156
- 【被引频次】1
- 【下载频次】73