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GaP(100)表面硫钝化与稀土金属Gd界面形成的同步辐射光电子能谱研究

Photoemission Study of S Passivated GaP(100) and Interface of Gd/S GaP(100) With Synchrotron Radiation

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【作者】 孙玉明陆尔东徐法强徐世红余小江张发培徐彭寿张新夷

【Author】 Sun Yuming, Lu Erdong, Xu Faqiang, Xu Shihong, Yu Xiaojiang, Zhang Fapei,Xu Pengshou, Zhang Xinyi (National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029)

【机构】 中国科学技术大学国家同步辐射实验室

【摘要】 利用同步辐射光电子能谱研究了CH3CSNH2钝化的GaP(100)表面和稀土金属Gd淀积到S-GaP(100)表面的界面形成,结果表明CH3CSNH2溶液对GaP(100)表面具有钝化作用,形成了Ga和P的硫化物钝化层,对钝化表面退火,P-S键逐渐消失,而仅仅留下了Ga-S键.Gd淀积到硫钝化退火的GaP表面,P的扩散被有效地阻止,而S仍保持在界面处,Gd与表面的元素态P和二聚体Ga反应,形成金属Ga向淀积的Gd金属层扩散,导致金属Ga在表面偏析.

【Abstract】 Abstract CH 3CSNH 2 passivated GaP(100) surface and interface of rare earth Gd deposited on S passivated GaP(100) have been studied by synchrotron radiation photoemission. The results show that the sulfides of Ga and P can be formed on GaP surface by CH 3CSNH 2 treatment. By annealing for passivated surface, the P S bond is gradually disappered and only Ga-S bond is remained in the surface. While Gd is deposited on such S GaP(100) surface, we found that eliminates the problems of the substrate P interdiffusion through the overlayer due to S being remained at the interface.

【基金】 国家自然科学基金
  • 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,1999年01期
  • 【分类号】O472.8,O472.8
  • 【被引频次】2
  • 【下载频次】52
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