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GaP(100)表面硫钝化与稀土金属Gd界面形成的同步辐射光电子能谱研究
Photoemission Study of S Passivated GaP(100) and Interface of Gd/S GaP(100) With Synchrotron Radiation
【摘要】 利用同步辐射光电子能谱研究了CH3CSNH2钝化的GaP(100)表面和稀土金属Gd淀积到S-GaP(100)表面的界面形成,结果表明CH3CSNH2溶液对GaP(100)表面具有钝化作用,形成了Ga和P的硫化物钝化层,对钝化表面退火,P-S键逐渐消失,而仅仅留下了Ga-S键.Gd淀积到硫钝化退火的GaP表面,P的扩散被有效地阻止,而S仍保持在界面处,Gd与表面的元素态P和二聚体Ga反应,形成金属Ga向淀积的Gd金属层扩散,导致金属Ga在表面偏析.
【Abstract】 Abstract CH 3CSNH 2 passivated GaP(100) surface and interface of rare earth Gd deposited on S passivated GaP(100) have been studied by synchrotron radiation photoemission. The results show that the sulfides of Ga and P can be formed on GaP surface by CH 3CSNH 2 treatment. By annealing for passivated surface, the P S bond is gradually disappered and only Ga-S bond is remained in the surface. While Gd is deposited on such S GaP(100) surface, we found that eliminates the problems of the substrate P interdiffusion through the overlayer due to S being remained at the interface.
- 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,1999年01期
- 【分类号】O472.8,O472.8
- 【被引频次】2
- 【下载频次】52