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深阱RF功率双极晶体管雪崩击穿特性的模拟分析

Simulation and Analysis of Avalanche Breakdown Characteristics of Deep\|well RF Power Bipolar Transistor

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【作者】 张玉才胡思福

【Author】 Zhang Yucai, Hu Sifu(Department of Microelectronic Science and Technology, University of Electronic Science and Technology of China, Chengdu\ 610054)Received 28 March 1998, revised manuscript received 25 June 1998

【机构】 电子科技大学微电子科学与工程系!成都610054

【摘要】 本文提出一种能有效提高 R F 功率晶体管雪崩击穿电压和频率特性的晶体管结构深阱 R F 功率双极晶体管,并且采用 M E D I C I分析软件研究了影响器件特性的一些因素:深阱阱壁的宽度与深度、阱壁填充介质、界面电荷以及场板.采用这种技术的功率晶体管( V H F,线性输出功率 15 W )的结构参数为 N C= 70×1015 cm - 3 N 型外延层,集电结结深 X J C= 03μm ,未掺杂多晶硅填充深槽.典型的器件雪崩击穿电压为 B V C B O= 72 V,截止频率 16 G Hz;并且该晶体管具有较小的漏电流(~20μ A).这初步显示了深阱结构在 R F 功率晶体管中的应用价值

【Abstract】 Deep\|well transistor is proposed as a new structure to efficiently improve the avalanche breakdown voltage and the cut\|off frequency of RF power transistors. Some factors related to device characters are discussed through MEDICI simulation. They are the width and depth of well\|wall trench, the fill dielectric, the interface charge, and the field plate.A typical power transistor (VHF class\|A 15W) with this structure has sachieved high avalanche breakdown voltage of BV CBO =72V and high cut\|off frequency of 1.6GHz, with N\|type epitaxial layer of N C=7.0 ×10 15 cm -3 , the collector junction depth of X JC =0.3μm, and the trenches filled with undoped polysilicon. Also it has small leakage current (typical~20μA). These results demonstrate the application value of the “Deep\|Well\|Transistor” to make RF power transistor.

  • 【文献出处】 半导体学报 ,CHINESE JOURNAL OF SEMICONDUCTORS , 编辑部邮箱 ,1999年08期
  • 【被引频次】2
  • 【下载频次】79
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