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LED-GaP外延晶片洁净优化技术的研究
Study of the Cleanness Optimized Technology on LED GaP Epitaxial Wafers
【摘要】 介绍了绿色、红色发光GaP外延晶片不同发光强度的无损检测方法。分别用短紫外光 (≤300nm ) 和蓝光 (488nm ) 激发方式, 在室温下, 有效地观测了LEDGaPvN (掺氮GaP晶片) 的多峰PL谱。根据对上述两种发光GaP外延晶片的相对光强与金属杂质Fe、Cu、Ni和Cr (以Fe 为主) 紫外荧光 (UVF) 谱的实测数据的相关性, 讨论了LEDGaP外延晶片的工艺质量优化和洁净度的问题
【Abstract】 The nondestructive inspection method on GaP epitaxial wafers emitting blue or red light in different luminescent intensities is introduced.And the multi peak PL spectra of LED GaP∶N wafers separately excited by short ultraviolet light(≤300nm)and blue light(488nm)can be observed efficiently at room temperature.According to the relative light intensity of the above two kinds of GaP epitaxial wafers and the data relativity of the UVF spectra of the metal impurities,such as Fe、Cu、Ni、Cr(mainly of Fe),the quality optimized process and cleanness degree on LED GaP epitaxial wafers are discussed.
【Key words】 GaP epitaxial wafer Cleanness degree optimization Nondestructive inspection Impurity Fe contamination;
- 【文献出处】 半导体技术 ,SEMICONDUCTOR TECHNOLOGY , 编辑部邮箱 ,1999年05期
- 【分类号】TN304.23;TN304.07
- 【被引频次】4
- 【下载频次】58