节点文献
间接耦合光探测器再分析
Further analysis on indirect coupling photodetectors
【摘要】 再次分析了间接耦合光探测器耦合系数定义的自相矛盾,指出这种器件的耦合区实际上是表面耗尽区,或者是表面反型层区,并说明这种器件结构本质上是一种MOS场效应结构。
【Abstract】 Further analysis is made on the self-contradiction of the definition of the coupling coefficient in indirect coupling photodetectors.In fact,the coupling region in the indirect coupling photodetector is the surface depletion layer region or the surface converse type layer region. It is believed that the structure of the indirect photodetector is a kind of MOS field effect structure.
【关键词】 间接耦合光探测器;
MOS场效应结构;
电荷耦合器件;
【Key words】 indirect coupling photodetectors; MOS field effect structure; CCD;
【Key words】 indirect coupling photodetectors; MOS field effect structure; CCD;
- 【文献出处】 半导体光电 ,Semiconductor Optoelectronics , 编辑部邮箱 ,1999年06期
- 【分类号】TN362
- 【被引频次】1
- 【下载频次】28