【作者】 吴喆； 刘昊； 周涛；

【Author】 WU Zhe;LIU Hao;ZHOU Tao;School of Physics, University of Electronic Science & Technology of China;

【机构】 电子科技大学物理学院；

【摘要】 近场微波显微术的发展为表征材料的电磁特性和微观形貌结构、缺陷检测和局部成分变化提供了有力的技术手段。我们提出了一种新的近场扫描微波显微系统的面扫描图像增强方法。根据点扫描响应曲线进行回溯,将图像整体范围迁移到探针-样品间距的零点附近,可以得到优化后的近场微波扫描图像。对覆盖了保护漆膜的印制电路板上开展了近场微波的穿透扫描成像,可识别出保护漆膜下方的断线。更多还原

【Abstract】 Development of near-field microwave microscopy provides powerful technical methods for characterization of electromagnetic properties and microstructure for materials, and defect detection for localized components. We propose a novel enhancement method for near-field scanning microwave imaging. Based on point scanning response curve, near-field microwave imaging can be migrated to approach the zero point of the probe-sample spacing. The penetration imaging of near-field scanning microwave microscopy was performed on printed circuit board covered with protective paint film.Broken wires below the protective paint film can be identified.更多还原