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Fe/SiO2纳米多层薄膜微波特性研究
Microwave Properties of Multilayered Fe/SiO2 Nanofilms
【Author】 HAO Yu;FAN Jinglong;JIANG Tian;FENG Yijun;School of Electronic Science and Engineering ,Nanjing University;
【机构】 南京大学电子科学与工程学院;
【摘要】 本文通过电子束蒸发工艺制备了Fe/SiO2纳米多层薄膜,使用这种薄膜构成了超薄微波吸波屏并分析研究了其微波吸收性能。采用同轴线法对薄膜的电磁参数进行了测量,测量结果表明通过调节单层薄膜厚度,可对薄膜样品的电磁参数进行调节。根据测量所得电磁参数建立了传输线模型,对这种薄膜构成的微波吸波屏在2-18GHz的吸波性能进行了理论分析计算。通过图像法对实验数据进行分析,计算结果得到了验证。与λ/4谐振型吸波屏相比,本文中制备的纳米薄膜构成的超薄吸波屏厚度可降低至λ/7,同时薄膜的柔韧性为吸波屏的共形设计提供了便利。
【Abstract】 In this paper,multilayered Fe/SiO2 nanofilms were deposited onto polyimide substrate via electron beam evaporation,which constructed a kind of microwave absorbing screen with the thickness of only one seventh of the corresponding resonate wavelength. Coaxial line method was adopted to measure the constitutive parameters of the nanofilms,which could be modified by adjusting the thickness of each film. Reflectivity of the absorbing screen between 2 and 18 GHz was obtained by free space method. The experimental data was in accordance with the theoretical calculation. Meanwhile,the flexibility of the film could help to design conformal electromagnetic shielding device.
【Key words】 Nanofilms; Coaxial line method; Transmission line model; Microwave absorbing screen;
- 【会议录名称】 2011年全国天线年会论文集(下册)
- 【会议名称】2011年全国天线年会
- 【会议时间】2011-10-18
- 【会议地点】中国江苏南京
- 【分类号】TB383.2
- 【主办单位】中国电子学会