【作者】 王亚飞； 郭旭东； 王双青； 杨国强；

【Author】 Yafei Wang;Xudong Guo;Shuangqing Wang;Guoqiang Yang;Institute of Chemistry, Chinese Academy of Sciences;

【机构】 中国科学院化学研究所光化学重点实验室；

【摘要】 光刻是制造微纳米元件的重要工艺过程,光刻胶是光刻中最重要的材料之一。与传统的聚合物光刻胶相比,分子玻璃光刻胶因其较高的线边缘粗糙度、更容易进行质量控制等特性,受到了广泛关注。本工作设计并制备了一种含有双酚A骨架的新型分子玻璃化合物BPA-10。该材料具有不对称的刚性核,呈现出高玻璃化转变温度和优异的热稳定性。将BPA-10与光致产酸剂等其它组分溶于丙二醇甲醚醋酸酯中,获得化学放大正性光刻胶。利用EUV曝光,获得的光刻图案特征尺寸最小可至33.7 nm,同时具有较低的线边缘粗糙度,优异的灵敏度和良好的高宽比图案。更多还原

【Abstract】 Lithography is an crucial step in micro-and nano-machining, in which photoresist is one of the most important electronic chemical materials. Compared with polymer photoresists, molecular glass photoresists have attracted widespread attention because of its better lithographic properties and high quality stability. Herein, a novel molecular glass compound(BPA-10) with a bisphenol A core was designed and synthesized. With an rigid asymmetric core, the compound exhibits high glass transition temperature and excellent thermal stability. A chemically amplified positive-tone photoresist can be obtained by dissolving BPA-10, the photoacid generator and other components in propylene glycol methyl ether acetate. Under EUV exposure, the resist showed excellent sensitivity, and high-resolution patterns were obtained. The minimum feature size was 33.7 nm. The patterns exhibited low line edge roughness and appropriate aspect ratios.更多还原